Day-to-Day Responsibilities
Set up and tune ion implanters so that the right dopant species reaches the wafer at the required energy and dose.
Select and adjust implant recipes for dopants such as boron, phosphorus and arsenic, based on the transistor region being formed.
Monitor beam current, uniformity and chamber conditions during production runs and act when readings drift.
Troubleshoot implanter faults with maintenance teams, and manage downtime so that wafer throughput stays on schedule.
Review wafer measurements such as sheet resistance and dopant profiles to confirm each implant met its specification.
Investigate yield losses that trace back to the implant step and recommend corrective changes with process integration teams.
Follow cleanroom, high-voltage, vacuum and gas safety procedures, and keep detailed records of every tool change.


